Resist Poisoning-Free Advanced PECVD-Based Anti-Reflective Coating (ARC) for 90 nm Technology and Beyond

Resist Poisoning-Free Advanced PECVD-Based Anti-Reflective Coating (ARC) for 90 nm Technology and Beyond

著者名:

Ahn, Sang H.

掲載資料名:

Micro- and nanosystems : symposium held December 1-3, 2003, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

782

発行年:

2004

開始ページ:

363

終了ページ:

370

総ページ数:

8

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558997202 [1558997202]

言語:

英語

請求記号:

M23500/782

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014439
シリーズID:	PA00000011
会議名:	Symposium on micro- and nanosystems
回次:	2003
会議開催地:	Boston, MA, USA
会議開催年:	2003.12.01-2003.12.03

類似資料:

1 国際会議録 Advanced PECVD-Based Anti-Reflective Coating for 90nm Generation Interconnects Ahn, Sang H., Fung, Miguel, Jung, Keebum, Zhu, Lei, Bencher, Chris, Kim, B.H., M'Saad, Hichem Materials Research Society	7 国際会議録 Stress Modulation of PECVD Silicon Nitride M. Balseanu, L. Q. Xia, V. Zubkov, M. Le, J. Lee, H. M'Saad Electrochemical Society
2 国際会議録 Beyond k1=0.25 lithography: 70-nm L/S patterning using KrF scanners Ebihara, T., Levenson, M.D., Liu, W., He, J., Yeh, W., Ahn, S., Oga, T., Shen, M., M'saad, H. SPIE - The International Society of Optical Engineering	8 国際会議録 Reliability of Dielectric Barrier Films in Copper Damascene Applications Lee, Albert S., Lakshmanan, Annamalai, Rajagopalan, Nagarajan, Cui, Zhenjiang, Le, Maggie, Xia, Li Qun, Kim, Bok Heon, … Materials Research Society
3 国際会議録 PECVD Silicon Nitride For Damascene Applications Lee, Albert, Rajagopalan, Nagarajan, Le, Maggie, Kim, Bok Heon, M’Saad, Hichem Materials Research Society	9 国際会議録 Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography Kim, S.-H., Lee, S.-H., Yeo, G.-S., Lee, J.H., Cho, H.-K., Han, W.-S., Moon, J.-T. SPIE-The International Society for Optical Engineering
4 国際会議録 Generating sub-30-nm polysilicon gates using PECVD amorphous carbon as hardmask and anti-reflective coating Liu, W., Mui, D., Lill, T., Wang, M.D., Bencher, C., Kwan, M., Yeh, W., Ebihara, T., Oga, T. SPIE-The International Society for Optical Engineering	10 国際会議録 Second-generation radiation sensitive developable bottom anti-reflective coatings (DBARC) and implant resists approaches for 193-nm lithography F. Houlihan, A. Dioses, M. Toukhy, A. Romano, J. Oberlander, H. Wu, S. Mullen, A. Krawicz, P. Lu, M. Neisser SPIE - The International Society of Optical Engineering
5 国際会議録 HDP-FSG Integration in Multilevel Interconnect Devices M'saad, H., Vellaikal, M., Zhang, L., Witty, D. MRS - Materials Research Society	11 国際会議録 Atomic Layer Deposition of Dielectrics and Electrodes for Embedded-DRAM Capacitor Cells in 90nm Technology and Beyond Gerritsen, E., Jourdan, N., Piazza, M., Fraboulet, D., Monsieur, F., Damlencourt, J.F., Martin, F., Mazaleyrat, E., … Electrochemical Society
6 国際会議録 Post Deposition Ultraviolet Treatment of Silicon Nitride Dielectric: Modeling and Experiment Vladimir Zubkov, Mihaela Balseanu, Li-Qun Xia, Hichem M'Saad Materials Research Society	12 国際会議録 5 Junction scaling for 90 nm and beyond Hwang, J., Kennel, H., Packan, P., Taylor, M., Liu, M., James, R., Kuhn, M. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12