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Relaxation of SiGe Films for the Fabrication of Strained Si Devices

著者名:
Maa, J. S.
Tweet, D. J.
Lee, J. J.
Hsu, S. T.
Fujii, K.
Naka, T.
Ueda, T.
Baba, T.
Awaya, N.
Sakiyama, K.
さらに 5 件
掲載資料名:
Intergration of heterogeneous thin-film materials and devices : symposium held April 23-24, 2003, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
768
発行年:
2003
開始ページ:
3
終了ページ:
8
総ページ数:
6
出版情報:
Warrendale, PA: Materials Research Society
ISSN:
02729172
ISBN:
9781558997059 [1558997059]
言語:
英語
請求記号:
M23500/768
資料種別:
国際会議録

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