Advanced Characterization of Ultra-Low-k Periodic Porous Silica Films: Pore Size Distribution, Pore-Diameter Anisotropy, and Size and Macroscopic Isotropy of Domain Structure
- 著者名:
Hata, N. Negoro, C. Takada, S. Yamada, K. Oku, Y. Kikkawa, T. - 掲載資料名:
- Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics-2003 : symposium held April 21-25, 2003, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 766
- 発行年:
- 2003
- 開始ページ:
- 191
- 終了ページ:
- 196
- 総ページ数:
- 6
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558997035 [1558997032]
- 言語:
- 英語
- 請求記号:
- M23500/766
- 資料種別:
- 国際会議録
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