Experiment and Modelization Results on Laser Thermal Processing for Ultra-Shallow Junction Formation: Influence of Laser Pulse Duration
- 著者名:
Venturini, J. Hernandez, M. Zahorski, D. Kerrien, G. Sarnet, T. Debarre, D. Boulmer, J. Laviron, C. Semeria, M. -N. Camel, D. Santailler, J. -L. - 掲載資料名:
- CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 765
- 発行年:
- 2003
- 開始ページ:
- 255
- 終了ページ:
- 260
- 総ページ数:
- 6
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558997028 [1558997024]
- 言語:
- 英語
- 請求記号:
- M23500/765
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
3
国際会議録
Single-Shot Excimer Laser Annealing and In Process Ellipsometry Analysis for Ultra Shallow Junctions
Materials Research Society |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
Society of Photo-optical Instrumentation Engineers |
Electrochemical Society |
Materials Research Society |
Electrochemical Society |