Influence of Substrate Temperature and Hydrogen Dilution Ratio on the Properties of Nanocrystalline Silicon Thin Films Grown by Hot-Wire Chemical Vapor Deposition | 東京工業大学附属図書館文献データベース

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Influence of Substrate Temperature and Hydrogen Dilution Ratio on the Properties of Nanocrystalline Silicon Thin Films Grown by Hot-Wire Chemical Vapor Deposition

著者名:

Moutinho, H. R.

Al-Jassim, M. M.

さらに 4 件

掲載資料名:

Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

762

発行年:

2003

開始ページ:

571

終了ページ:

576

総ページ数:

6

出版情報:

Warrendale: Materials Research Society

ISSN:

02729172

ISBN:

9781558996991 [1558996990]

言語:

英語

請求記号:

M23500/762

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014420
シリーズID:	PA00000011
会議名:	Symposium on amorphous and nanocrystalline silicon-based films
回次:	2003
会議開催地:	San Francisco, CA, USA
会議開催年:	2003.04.22-2003.04.25

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