Hot-Wire Chemical Vapor Deposition for Epitaxial Silicon Growth on Large-Grained Polycrystalline Silicon Templates

Hot-Wire Chemical Vapor Deposition for Epitaxial Silicon Growth on Large-Grained Polycrystalline Silicon Templates

著者名:

掲載資料名:

Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

762

発行年:

2003

開始ページ:

551

終了ページ:

558

総ページ数:

8

出版情報:

Warrendale: Materials Research Society

ISSN:

02729172

ISBN:

9781558996991 [1558996990]

言語:

英語

請求記号:

M23500/762

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014420
シリーズID:	PA00000011
会議名:	Symposium on amorphous and nanocrystalline silicon-based films
回次:	2003
会議開催地:	San Francisco, CA, USA
会議開催年:	2003.04.22-2003.04.25

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2 国際会議録 Gas Phase and Surface Kinetic Processes in Polycrystalline Silicon Hot-Wire Chemical Vapor Deposition Holt, J.K., Swiatek, M., Goodwin, D.G., Atwater, H.A., Muller, R.P., Goddard, W.A., III Electrochemical Society	8 国際会議録 Hydrogenated Amorphous Silicon Germanium Alloys Grown by the Hot-Wire Chemical Vapor Deposition Technique Nelson, Brent P., Xu, Yueqin, Williamson, D. L., Roedern, Bolko von, Mason, Alice, Heck, Stephan, Mahan, A. H., Schmitt, … MRS - Materials Research Society
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