Blank Cover Image

Mo-Si Interface Formation by Ion Beam Sputter Deposition

著者名:
Kohler, A.
Gerlach, J.W.
Hoche, T.
Chasse, T.
Neumann, H.
Frank, W.
Wagner, G.
Rauschenbach, B.
さらに 3 件
掲載資料名:
Morphological and compositional evolution of thin films : symposium held December 2-5, 2002, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
749
発行年:
2003
開始ページ:
329
終了ページ:
334
総ページ数:
6
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558996861 [1558996869]
言語:
英語
請求記号:
M23500/749
資料種別:
国際会議録

類似資料:

1 国際会議録 Titanium Nitride Formation by Low Energy Ar Ion Bombardment and UV-Light Irradiation During Deposition

Gerlach, J. W., Wengenmair, H., Stritzker, B., Rauschenbach, B.

MRS - Materials Research Society
7 国際会議録 Importance of Internal Ion Beam Parameters on the Self-organized Pattern Formation with Low-energy Broad Beam Ion Sources

Bashkim Ziberi, Marina I. Cornejo, Frank Frost, Horst Neumann, Michael Tartz, Bernd Rauschenbach

Materials Research Society
2 国際会議録 Dot Pattern Formation on Silicon Surfaces by Low-Energy Ion Beam Erosion

Ziberi, B., Frost, F., Hoche, T., Rauschenbach, B.

Materials Research Society
8 国際会議録 Ion beam and plasma jet etching for optical component fabrication

Schindler,A., Haensel,T., Flamm,D., Frank,W., Boehm,G., Frost,F., Fechner,R., Bigl,F., Rauschenbach,B.

SPIE-The International Society for Optical Engineering
3 国際会議録 Stress formation in boron nitride films prepared by ion beam assisted deposition

Rauschenbach, B., Sienz, S.

MRS-Materials Research Society
9 国際会議録 SYNTHESIS AND PROPERTIES OF Mo/MoSiX MICROLAMINATES USING ION BEAM ASSISTED DEPOSITION

Mashayekhi, A., Parfitt, L., Kalnas, C., Jones, J.W., Was, G.S., Hoffman, D.W.

Materials Research Society
4 国際会議録 Swift Heavy Ion Irradiation Induced Effects in Si/SiOx Multi-Layered Films and Nanostructures

Jurgen W. Gerlach, C. Patzig, W. Assmann, A. Bergmaier, Th. Höche, J. Zajadacz, R. Fechner, Bernd Rauschenbach

Materials Research Society
10 国際会議録 Study of low-energy ion assisted epitaxy of GaN films: Influence of the initial growth rate

Gerlach, J. W., Schrupp, D., Schwertberger, R., Rauschenbach, B., Anders, A.

MRS-Materials Research Society
5 国際会議録 Ion Beam Assisted Texture Evolution During Thin Film Deposition of Metal Nitrides

Stritzker, Bernd, Gerlach, Juergen W., Six, Stephan, Rauschenbach, Bernd

Materials Research Society
11 国際会議録 Carbon Nitride Formation by Plasma Assisted Ion Beam Deposition

Tompa, G. S., Murzin, I. H., Kim, S. I., Ahn, Y. O., Gallois, B., Fischer, T. E., Forsythe, E. W.

MRS - Materials Research Society
6 国際会議録 Precision optical asphere fabrication by plasma jet chemical etching (PJCE) and ion beam figuring

Schindler,A., Boehm,G., Haensel,T., Frank,W., Nickel,A., Rauschenbach,B., Bigl,F.

SPIE-The International Society for Optical Engineering
12 国際会議録 ION BEAM SPUTTER DEPOSITION OF REFRACTORY METAL OXIDES

Kempf, B. E., Dinges, H. W., Pocker, A.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12