Study of Interface Formation of (Ba,Sr)TiO3 Thin Films Grown by rf Sputter Deposition on Bare Si and Thermal SiO2/Si Substrates

Study of Interface Formation of (Ba,Sr)TiO3 Thin Films Grown by rf Sputter Deposition on Bare Si and Thermal SiO2/Si Substrates

著者名:

掲載資料名:

Crystalline oxide-silicon heterostructures and oxide optoelectronics : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

747

発行年:

2003

開始ページ:

183

終了ページ:

192

総ページ数:

10

出版情報:

Warrendale, PA: Materials Research Society

ISSN:

02729172

ISBN:

9781558996847 [1558996842]

言語:

英語

請求記号:

M23500/747

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014407
シリーズID:	PA00000011
会議名:	Symposium on crystalline oxide-silicon heterostructures and oxide optoelectronics
回次:	2002
会議開催地:	Boston, MA, USA
会議開催年:	2002.12.02-2002.12.04

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