Growth and Physical Properties of MOCVD-Deposited Hafnium Oxide Films and Their Properties on Silicon
- 著者名:
Elshocht, S.Van Caymax, M. Gendt, S.De Conard, T. Petry, J. Claes, M. Witters, T. Zhao, C. Brijs, B. Richard, O. Bender, H. Vandervorst, W. Carter, R. Kluth, J. Date, L. Pique, D. Heyns, M.M. - 掲載資料名:
- Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 745
- 発行年:
- 2003
- 開始ページ:
- 197
- 終了ページ:
- 202
- 総ページ数:
- 6
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996823 [1558996826]
- 言語:
- 英語
- 請求記号:
- M23500/745
- 資料種別:
- 国際会議録
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