Kinetics of Agglomeration of NiSi and NiSi2 Phase Formation

Kinetics of Agglomeration of NiSi and NiSi2 Phase Formation

著者名:

掲載資料名:

Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

745

発行年:

2003

開始ページ:

135

終了ページ:

142

総ページ数:

8

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558996823 [1558996826]

言語:

英語

請求記号:

M23500/745

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014405
シリーズID:	PA00000011
会議名:	Symposium on novel materials and processes for advances CMOS
回次:	2002
会議開催地:	Boston, MA, USA
会議開催年:	2002.12.02-2002.12.04

類似資料:

1 国際会議録 In Situ Monitoring of Thin Film Reactions During Rapid Thermal Annealing: Nickel Silicide Formation Lavoje, C., Purtell, R., Cola, C., Detavernier, C., Desjardins, P., Jordan-Sweet, J., Cabral, C., Jr., d'Heurle, F.M., … Electrochemical Society	7 国際会議録 46 Evaluation of CMOS gate metal materials using in situ characterization techniques Cabral, C., Jr., Lavoje, C., Ozcan, A.S., Amos, R.S., Naroyanan, V., Gusev, E.P., Jordan-Sweet, J.L., Harpe, J.M.E. Electrochemical Society
2 国際会議録 Influence of Substrate Temperature During Sputter Deposition on the Subsequent Formation of Titanium Disilicide Ozcan, A.S., Ludwig Jr., K.F., Cabral Jr., C., Lavoie, C., Harper, J.M.E. Materials Research Society	8 国際会議録 Texture Effects in Solid-State Reactions of Thin Films K. De Keyser, C. Detavernier, J.J. Sweet, C. Lavoie Trans Tech Publications
3 国際会議録 In-situ Studies of Silicide Formation in Ti-Ta Bilayer Thin Films on Poly-Si Ozcan, A.S., Ludwig K.F., Jr., Lavoie, C., Cabral, C., Jr., Harper, J.M.E. Materials Research Society	9 国際会議録 70 Reactive Diffusion in the Ni-Si System: Influence of Ni Thickness on the Phase Formation Sequence Coia, C., Lavoie, C., d'Heurle, F. M., Desjardins, P., Detavernier, C., Kellock, A. J. (Invited Paper) Electrochemical Society
4 国際会議録 Influence of Alloying Elements on the Formation and Stability of NiSi C. Detavernier, D. Deduytsche, J. Jordan-Sweet, C. Cabral, C. Lavote Electrochemical Society	10 国際会議録 Is Selective CVD an Improvement for the Titanium Silicide Process in Sub-Quarter Micron Technology? A Phase Formation Study Using X-ray Diffraction Roy, Ronnen, Cabral, Cryil, Jr., Lavoie, Christian, Jordan-Sweet, Jean, Viswanathan, R., Ozturk, Mehmet, Fang, Hua, … MRS - Materials Research Society
5 国際会議録 Light Scattering Measurement of Surface Topography During Formation of Titanium Silicide Lavoie, C., Cabral, C., Jr., Clevenger, L. A., Harper, J. M. E., Jordan-Sweet, J., Saenger, K. L., Doany, F. MRS - Materials Research Society	11 国際会議録 Is Selective CVD an Improvement for the Titanium Silicide Process in Sub-Quarter Micron Technology? A Phase Formation Study Using X-ray Diffracion Roy, Ronnen, Cabral, Cryil, Jr., Lavoie, Christian, Jordan-Sweet, Jean, Viswanathan, R., Ozturk, Mehmet, Fang, Hua, … MRS - Materials Research Society
6 国際会議録 Dependence of Crystallographic Texture of C54 TiSi2 on Thickness and Linewidth in Submicron CMOS Structures Svilan, V., Rodbell, K. P., Clevenger, L. A., Cabral, C., Jr., Roy, R. A., Lavoie, C., Jordan-Sweet, J., Harper, J. M. … MRS - Materials Research Society	12 国際会議録 In Situ Analysis of the Formation of Thin TiSi2 (<50 nm) Contacts in Submicron CMOS Structures During Rapid Thermal Annealing Clevenger, L. A., Cabral, C., Jr, Roy, R. A., Lavoie, C., Viswanathan, R., Saenger, K. L., Jordan-Sweet, J., Morales, … MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12