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ALD Deposited Al2O3 Films on 6H-SiC(0001) after Annealing in Hydrogen Atmosphere

著者名:
Gao, K. Y.
Seyller, T.
Emtsev, K.
Ley, L.
Ciobanu, F.
Pensl, G.
さらに 1 件
掲載資料名:
Silicon carbide and related materials 2004 : ECSCRM 2004 : proceedings of the 5th European Conference on Silicon Carbide and Related Materials, August 31 - September 4 2004, Bologna, Italy
シリーズ名:
Materials science forum
シリーズ巻号:
483-485
発行年:
2005
開始ページ:
559
終了ページ:
562
総ページ数:
4
出版情報:
Uetikon-Zuerich: Trans Tech Publications
ISSN:
02555476
ISBN:
9780878499632 [0878499636]
言語:
英語
請求記号:
M23650
資料種別:
国際会議録

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