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Epitaxial Oxide Films on Silicon: Growth, Modeling and Device Properties

著者名:
Droopad, R.
Wang, J.
Eisenbeiser, K.
Yu, Z.
Ramdani, J.
Curless, J.A.
Overgaard, C.D.
Finder, J.M.
Hallmark, J.A.
Kaushik, V.
Nguyen, B.Y.
Marshall, D.S.
Ooms, W.J.
さらに 8 件
掲載資料名:
Recent developments in oxide and metal epitaxy : theory and experiment
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
619
発行年:
2000
開始ページ:
155
終了ページ:
166
総ページ数:
12
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558995277 [1558995277]
言語:
英語
請求記号:
M23500/619
資料種別:
国際会議録

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