Interfacial Fluid Pressure and Its Effects on SiO2 Chemical Mechanical Polishing
- 著者名:
Zhou, C. Shan, L. Hight, J.R. Ng, S.H. Paszkowski, A.J. Tichy, J. Danyluk, S. - 掲載資料名:
- Chemical mechanical polishing 2000 -- fundamentals and materials issues : symposium held April 26-27, 2000, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 613
- 発行年:
- 2001
- 開始ページ:
- E7.1
- 出版情報:
- Warrendale, PA: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558995215 [1558995218]
- 言語:
- 英語
- 請求記号:
- M23500/613
- 資料種別:
- 国際会議録
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