Fundamental Studies on the Mechanisms of Oxide CMP

Fundamental Studies on the Mechanisms of Oxide CMP

著者名:

掲載資料名:

Chemical mechanical polishing 2000 -- fundamentals and materials issues : symposium held April 26-27, 2000, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

613

発行年:

2001

開始ページ:

E1.7

出版情報:

Warrendale, PA: Materials Research Society

ISSN:

02729172

ISBN:

9781558995215 [1558995218]

言語:

英語

請求記号:

M23500/613

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014201
シリーズID:	PA00000011
会議名:	Symposium on chemical mechanical polishing
回次:	2000
会議開催地:	San Francisco, CA, USA
会議開催年:	2000.04.26-2000.04.27

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