Molybdenum As A Gate Electrode For Deep Sub-Micron CMOS Technology
- 著者名:
Ranade, Pusnkar Yeo, Yee-Chia Lu, Qiang Takeuchi, Hideki King, Tsu-Jae Hu, Chenming - 掲載資料名:
- Gate stack and silicide issues in silicon processing : symposium held April 25-27, 2000, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 611
- 発行年:
- 2001
- 開始ページ:
- C3.2
- 出版情報:
- Warrendale, PA: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558995192 [1558995196]
- 言語:
- 英語
- 請求記号:
- M23500/611
- 資料種別:
- 国際会議録
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