Blank Cover Image

Junction Depth Reduction Of Ion Implanted Boron In Silicon Through Fluorine Ion Implantation

著者名:
Robertson, L. S.
Warnes, P. N.
Jones, K. S.
Earles, S. K.
Law, M. E.
Downey, D. F.
Falk, S.
Liu, J.
さらに 3 件
掲載資料名:
Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
610
発行年:
2001
開始ページ:
B4.2
出版情報:
Warrendale, PA: Materials Research Society
ISSN:
02729172
ISBN:
9781558995185 [1558995188]
言語:
英語
請求記号:
M23500/610
資料種別:
国際会議録

類似資料:

Robertson, L.S., Brindos, R., Jones, K. S., Law, Mark E., Downey, D. F., Falk, S., Liu, J.

Materials Research Society

Banisaukas, Heather Brye, Jones, K.S., Talwar, Somit, Falk, S., Downey, D.F.

Materials Research Society

Jones, K.S., Banisaukis, H., Earles, S., Lindfors, C., Griglione, M., Law, M.E., Taiwar, S., Falk, S.W., Downey, D.F., …

Electrochemical Society

Jones, K.S., Gable, K.A., Law, M.E., Robertson, L.S., Talwar, S.

Materials Research Society

Jacques, J.M., Burbure, N., Jones, K.S., Law, M.E., Robertson, L.S., Downey, D.F., Rubin, L.M., Bennett, J., Beebe, M., …

Materials Research Society

Benton, J.L., Stolk, P.A., Eaglesham, D.J., Jacobson, D.C., Cheng, J.Y., Poate, J.M., Myers, S.M., Haynes, T.E

Electrochemical Society

Jacques, J.M., Robertson, L.S., Jones, K.S., Bennett, Joe, Rendon, Mike

Materials Research Society

Crosby, R.T., Jones, K.S., Law, M.E., Saavedra, A.F., Hansen, J.L., Larsen, A.N., Liu, J.

Materials Research Society

Liu, J., Jones, K. S., Downey, D. F., Mehta, S.

MRS - Materials Research Society

Jones, K. S., Liu, J., Zhang, L.

Electrochemical Society

Lavine, J. P., Zheng, L., Whalen, P. M., Downey, D. F.

MRS - Materials Research Society

Liu, Xiao, Pohl, R. O., Crandall, Richard S., Jones, K. M.

MRS - Materials Research Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12