Blank Cover Image

Interfacial Pressure Measurements at Chemical-Mechanical Polishing Interfaces

著者名:
掲載資料名:
Chemical mechanical polishing -- fundamentals and challenges : symposium held April 5-7, 1999, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
566
発行年:
2000
開始ページ:
187
終了ページ:
196
総ページ数:
10
出版情報:
Warrendale, PA: Materials Research Society
ISSN:
02729172
ISBN:
9781558994737 [1558994734]
言語:
英語
請求記号:
M23500/566
資料種別:
国際会議録

類似資料:

1 国際会議録 Interfacial Fluid Pressure and Its Effects on SiO2 Chemical Mechanical Polishing

Zhou, C., Shan, L., Hight, J.R., Ng, S.H., Paszkowski, A.J., Tichy, J., Danyluk, S.

Materials Research Society
7 国際会議録 Characterization of the Chemical Interactions on Copper Chemical Mechanical Polishing

Lee, S.-M., Abiade, J., Choi, W., Singh, R.

Electrochemical Society
2 国際会議録 Effects of Nano-scale Colloidal Abrasive Particle Size on SiO2 by Chemical Mechanical Polishing

Zhou, Chunhong, Shan, Lei, Ng, S.H., Hight, Robert, Paszkowski, Andrew J., Danyluk, S.

Materials Research Society
8 国際会議録 Chemical Mechanical Polishing on Extremely Low Expansion Glass Ceramic Wafers

Z.F. Shi, Z.Y. Zhang, S.L. Huang, B.Y. Yuan, X.G. Guo, P. Zhou, Z.J. Jin

Trans Tech Publications
3 国際会議録 Mechanical Modeling of the 2D Interfacial Slurry Pressure in CMP

Higgs III, C. Fred, Ng, Sum Huan, Yoon, Inho, Shan, Lei, Yap, Lipkong, Danyluk, Steven

Materials Research Society
9 国際会議録 CHARACTERIZATION OF CHEMICAL-MECHANICAL POLISHING DIELECTRICS FOR MULTILEVEL METALLIZATION

Sun, S. C., Yeh, F. L., Tien, H. Z.

MRS - Materials Research Society
4 国際会議録 Tungsten Chemical-Mechanical Polishing Endpoint Detection

Golzarian, R., Gonzales, S., Luttzen, J., Sue, L., Wertsching, F.

Materials Research Society
10 国際会議録 Planarization of Copper Damascene Interconnects by Spin-Etch Process: A Chemical Approach

Mukherjee, S.P., Levert, J.A., DeBear, D.S.

Materials Research Society
5 国際会議録 The Characteristic of Abrasive Particle in Chemical - Mechanical Polishing

Tsai, H.J., Chang, C.C., Jeng, Y.R., Chen, S.L.

Trans Tech Publications
11 国際会議録 Copper Removal from Chemical Mechanical Polishing Effluent

Riley, C., Filson, J., Mendicino, L., Brown, P.T.

Electrochemical Society
6 国際会議録 Investigation of the Role of Chemical-Mechanical Polishing in Improving the Performance of Polysilicon TFTs

Armstrong, B. M., Baine, P. T., Gamble, H. S., Lee, B., Mitchell, S. J. N., Quinn, L. J.

Materials Research Society
12 国際会議録 In-line monitoring of chemical-mechanical polishing processes

Hetherington,D.L., Stein,D.J.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12