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Processing and Characterization of Silica Xerogel Films for Low-K Dielectric Applications

著者名:
Gill, W. N.
Jain, A.
Nitta, S. V.
Oehrlein, G. S.
Pisupattt, V.
Plawsky, J. L.
Rogojevic, S.
Staert, T. E. F. M.
Wayner, P. C.
さらに 4 件
掲載資料名:
Low-dielectric constant materials V : symposium held April 5-8, 1999, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
565
発行年:
1999
開始ページ:
29
終了ページ:
40
総ページ数:
12
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558994720 [1558994726]
言語:
英語
請求記号:
M23500/565
資料種別:
国際会議録

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