Growth and Structure of Metallic Barrier Layers and Interconnect Films II: Atomistic Simulations of Film Deposition Onto Inclined Surfaces

Growth and Structure of Metallic Barrier Layers and Interconnect Films II: Atomistic Simulations of Film Deposition Onto Inclined Surfaces

著者名:

Baumann, F. H.

掲載資料名:

Polycrystalline metal and magnetic thin films : symposium held April 5-8, 1999, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

562

発行年:

1999

開始ページ:

129

終了ページ:

134

総ページ数:

6

出版情報:

Warrendale, PA: Materials Research Society

ISSN:

02729172

ISBN:

9781558994690 [1558994696]

言語:

英語

請求記号:

M23500/562

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014190
シリーズID:	PA00000011
会議名:	Symposium on polycrystalline metal and magnetic thin films
回次:	1999
会議開催地:	San Francisco, CA, USA
会議開催年:	1999.04.05-1999.04.08

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