High-Quality Microcrystalline Silicon-Carbide Films Prepared by Photo-CVD Method Using Ethylene Gas as a Carbon Source

High-Quality Microcrystalline Silicon-Carbide Films Prepared by Photo-CVD Method Using Ethylene Gas as a Carbon Source

著者名:

掲載資料名:

Amorphous and heterogeneous silicon thin films : fundamentals to devices - 1999 : symposium held April 5-9, 1999, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

557

発行年:

1999

開始ページ:

603

終了ページ:

608

総ページ数:

6

出版情報:

Warrendale: Materials Research Society

ISSN:

02729172

ISBN:

9781558994645 [1558994645]

言語:

英語

請求記号:

M23500/557

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014188
シリーズID:	PA00000011
会議名:	Symposium on amorphous and heterogeneous silicon thin films
回次:	1999
会議開催地:	San Francisco, CA, USA
会議開催年:	1999.04.05-1999.04.09

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