Surface Photovoltage Characterization of Heavy Metal Contamination and Wafer Cleaning Efficiency in Wet Chemical Processes

Surface Photovoltage Characterization of Heavy Metal Contamination and Wafer Cleaning Efficiency in Wet Chemical Processes

著者名:

Rosato, J.J.

掲載資料名:

Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

1994-33

発行年:

1994

開始ページ:

163

終了ページ:

170

総ページ数:

8

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770927 [1566770920]

言語:

英語

請求記号:

E23400/951106

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014142
シリーズID:	PA00000028
会議名:	Symposium on Diagnostic Techniques for Semiconductor Materials and Devices ; Electrochemical Society Meeting
回次:	3rd ; 1994
会議開催地:	Miami Beach, FL, USA
会議開催年:	1994.10.10-1994.10.12

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2 国際会議録 Surface Photovoltage Monitoring of Silicon Surface Native and Chemical Oxides Following Wafer Cleaning and Rinsing Operations Rosato, John J., Hall, R. Mark, Parry, Thad B., Lindquist, Paul G., Jarvis, Taura D. MRS - Materials Research Society	8 国際会議録 Surface Preparation and Cleaning Challenges for Sub-65 nm Process Integration Rosato, J.J. Electrochemical Society
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