Blank Cover Image

Minimization of the Profile Microloading in Polysilicon Etching

著者名:
Lum, R.
Tsai, P.
Furr, M.
Bucknall, R.E.
Wiltse, M.
Hills, G.W.
さらに 1 件
掲載資料名:
Proceedings of the tenth symposium on plasma processing
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
1994-20
発行年:
1994
開始ページ:
254
終了ページ:
263
総ページ数:
10
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770774 [1566770777]
言語:
英語
請求記号:
E23400/941901
資料種別:
国際会議録

類似資料:

1 国際会議録 Controlling of Microloading Effect of Polysilicon Etching in High Density ECR Etcher

Yang, M., Jackson, R., Lassiter, T.

Electrochemical Society
7 国際会議録 Studies of the Relationship Between Megasonics, Surface Etching, and Particle Removal in SC-1 Solutions

Cohen, S. L., Rath, D., Lee, G., Furman, B., Pope, K. R., Tsai, R., Syverson, W., Gow, C., Liehr, M.

MRS - Materials Research Society
2 国際会議録 The Development and Performance of an Electrostatic Chuck for Silicon Etches

Su, J., Hills, G.W., Tsai, P.

Electrochemical Society
8 国際会議録 Large-format Si:As IBC array performance for NGST and future IR space telescope applications

Ennico, K.A., McKelvey, M.E., McCreight, C.R., McMurray, R.E., Jr., Johnson, R., Hoffman, A.W., Love, P.J., Lum, N.A.

SPIE-The International Society for Optical Engineering
3 国際会議録 Residual Fluorine Effects on High Selectivity HBr/Cl2 Etches

Hemker, D.J., Qian, X.Y., Lum, R.T., Hills, G.W.

Electrochemical Society
9 国際会議録 Aerosol fluorescence spectrum analyzer for individual airborne biological particles

Chen,G., Pinnick,R.G., Hill,S.C., Chang,R.K., Nachman,P., Videen,G.W.

SPIE-The International Society for Optical Engineering
4 国際会議録 Deposition and Etching Processes in InGaAsP Materials

Lum, R.M.

Electrochemical Society
10 国際会議録 KrF* LASER-INDUCED CHEMICAL ETCHING OF NICKEL WITH Br2

Tyndall, G.W., Moylan, C.R.

Materials Research Society
5 国際会議録 Factors Affecting Charge-up in a Magnetically Enhanced RIE Polysilicon Etcher

Jha, N., Shin, H., Hills, G.W., Qian, X.Y., Hu, C.

Electrochemical Society
11 国際会議録 Comparison of Etch Characteristics with Oxide Masks and Resist Masks in Polysilicon Etching

Fang, L.M., Amini, Z.H., Tipton, G., Everist, S., Jarecki, R.

Electrochemical Society
6 国際会議録 Capability of spectroscopic ellipsometry-based profile metrology for detecting the profile excursion of polysilicon gate

Yeh, M., Fang, S.-P., Tsau, B.-J., Huang, C.-C., Lin, B.S., Fu, S., Chen, J.C., Freed, R., Dziura, T.G., Slessor, M.D.

SPIE - The International Society of Optical Engineering
12 国際会議録 Water content and water profiles in skin measured by FTIR and Raman spectroscopy

Lucassen,G.W., Caspers,P., Puppels,G.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12