Electrical Characterization and Surface Analysis of Dry Etch Induced Damage on Si after Etching in an Electron Cyclotron Resonance Source
- 著者名:
- 掲載資料名:
- Proceedings of the tenth symposium on plasma processing
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 1994-20
- 発行年:
- 1994
- 開始ページ:
- 132
- 終了ページ:
- 143
- 総ページ数:
- 12
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566770774 [1566770777]
- 言語:
- 英語
- 請求記号:
- E23400/941901
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Damage Investigation of GaAs and InGaP Dry Etched with an Electron Cyclotron Resonance Source
Electrochemical Society |
Materials Research Society |
Electrochemical Society |
MRS - Materials Research Society |
MRS - Materials Research Society |
MRS - Materials Research Society |
Electrochemical Society |
10
国際会議録
IN-SITU MONITORING BY MASS SPECTROMETRY FOR GaAs ETCHED WITH AN ELEFCTRON CYCLOTRON RESONANCE SOURCE
MRS - Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Electrochemical Society |