Thermodynamic and Kinetic Studies of Si1-xGex Chemical Vapor Deposition

Thermodynamic and Kinetic Studies of Si1-xGex Chemical Vapor Deposition

著者名:

掲載資料名:

Proceedings of the Symposium on Large Area Wafer Growth and Processing for Electronic and Photonic Devices and the twentieth State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XX)

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

1994-18

発行年:

1994

開始ページ:

56

終了ページ:

64

総ページ数:

9

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770750 [1566770750]

言語:

英語

請求記号:

E23400/950354

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014127
シリーズID:	PA00000028
会議名:	Symposium on Large Area Wafer Growth and Processing for Electronic and Photonic Devices ; State-of-the-Art Program on Compound Semiconductors - SOTAPOCS ; Meeting of the Electrochemical Society
回次:	1994 ; 20th ; 185th
会議開催地:	San Francisco, CA, USA
会議開催年:	1994.05.22-1994.05.27

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