*CLEANING OF METAL CONTAMINATION

*CLEANING OF METAL CONTAMINATION

著者名:

Mertens, P.W.

掲載資料名:

Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

1994-9

発行年:

1994

開始ページ:

241

終了ページ:

252

総ページ数:

12

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770415 [1566770416]

言語:

英語

請求記号:

E23400/941386

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014118
シリーズID:	PA00000028
会議名:	Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing
回次:	3rd
会議開催地:	San Francisco, CA, USA
会議開催年:	1994.05.23-1994.05.27

類似資料:

1 国際会議録 IMPACT OF THE ELECTROCHEMICAL PROPERTIES OF SILICON WAFER SURFACES ON COPPER OUTPLATING FROM HF SOLUTIONS Teerlinck, I., Schmidt, H.F., Rotondaro, A.L.P., Hurd, T.Q., Mouche, L., Mertens, P.W., Meuris, M., Heyns, M.M., … Electrochemical Society	7 国際会議録 In-situ and real time characterization of wet chemical silicon surface processes by electrochemical open circuit potential measurements Schmidt, H.F, Teerlinck, I., Meuris, M., Mertens, P.W., Heyns, M.M. Electrochemical Society
2 国際会議録 COMPARISON OF HC1 GAS-PHASE CLEANING WITH CONVENTIONAL AND DILUTE WET CHEMISTRIES Elsmore, C., Hurd, T.Q., Clarke, J., Meuris, M., Mertens, P.W., Heyns, M.M. Electrochemical Society	8 国際会議録 18 Optimized HF Solutions in ULSI Technology Teerlinck, I., Mertens, P.W., Vos, R., Meuris, M., Heyns, M.M. Electrochemical Society
3 国際会議録 METAL INTERACTIONS WITH SILICA (SiO2) SURFACES: ADSORPTION AND ION EXCHANGE Hurd, T.Q., Schmidt, H.F., Rotondaro, A.L.P., Mertens, P.W., Hall, L.H., Heyns, M.M. Electrochemical Society	9 国際会議録 NEW WET CLEANING STRATEGIES FOR OBTAINING HIGHLY RELIABLE THIN OXIDES Heyns, M. M., Verhaverbeke, S., Meuris, M., Mertens, P. W., Schmidt, H., Kubota, M., Philipossian, A., Dillenbeck, K., … MRS - Materials Research Society
4 国際会議録 A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES Meuris, M., Verhaverbeke, S., Mertens, P.W., Schmidt, H.F., Rotondaro, A.L.P., Heyns, M.M., Philipossian, A. Electrochemical Society	10 国際会議録 Effect of Metal Contamination and Improved Cleaning Strategies Mertens, P.W., Bearda, T., Lowewenstein, L.M., Martin, A.R., Hub, W., Kolbesen, B.O., Teerlink, I., Vos, R., Baeyens, … Electrochemical Society
5 国際会議録 CRITICAL ASPECTS OF WAFER CLEANING AND GATE OXIDE INTEGRITY Mertens, P.W., Meuris, M., Schmidt, H.F., Verhaverbeke, S., Heyns, M.M., Carr, P., Graeff, D., Schnegg, A., Kubota, M., … Electrochemical Society	11 国際会議録 MODELLING OF THE HYDROGEN PASSIVATION KINETICS OF Si IN DILUTE HF SOLUTIONS Verhaverbeke, S., Meuris, M., Schmidt, H., Mertens, P., Heyns, M. Electrochemical Society
6 国際会議録 HF-LAST CLEANINGS: A STUDY OF THE PROPERTIES WITH RESPECT TO THE DIFFERENT VARIABLES Verhaverbeke, S., Bender, H., Meuris, M., Mertens, P. W., Schmidt, H. F., Heyns, M. M. MRS - Materials Research Society	12 国際会議録 Advanced Wet Cleaning Technology For Highly Reliable Thin Oxides Verhaverbeke, S., Meuris, M., Mertens, P., Schmidt, H., Heyns, M.M., Philipossian, A., Graeff, D., Dillenbeck, K. Electrochemical Society

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