METAL CONTAMINATION AND SILICON DAMAGE EFFECTS OF OXIDE PLASMA ETCH PROCESSES

METAL CONTAMINATION AND SILICON DAMAGE EFFECTS OF OXIDE PLASMA ETCH PROCESSES

著者名:

Vincs, L.

掲載資料名:

Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

1994-9

発行年:

1994

開始ページ:

141

終了ページ:

153

総ページ数:

13

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770415 [1566770416]

言語:

英語

請求記号:

E23400/941386

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014118
シリーズID:	PA00000028
会議名:	Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing
回次:	3rd
会議開催地:	San Francisco, CA, USA
会議開催年:	1994.05.23-1994.05.27

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