Blank Cover Image

A SEMI-QUANTITATIVE METHOD FOR STUDYING PHOTORESIST STRIPPING

著者名:
Rotondaro, A.L.P.
Meuris, M.
Schmidt, H.F.
Heyns, M.M.
Vandervorst, W.
Claeys, C.
Hellemans, L.
Snauvaert, I.
さらに 3 件
掲載資料名:
Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
1994-7
発行年:
1994
開始ページ:
581
終了ページ:
586
総ページ数:
6
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770385 [1566770386]
言語:
英語
請求記号:
E23400/941397
資料種別:
国際会議録

類似資料:

1 国際会議録 IMPACT OF THE ELECTROCHEMICAL PROPERTIES OF SILICON WAFER SURFACES ON COPPER OUTPLATING FROM HF SOLUTIONS

Teerlinck, I., Schmidt, H.F., Rotondaro, A.L.P., Hurd, T.Q., Mouche, L., Mertens, P.W., Meuris, M., Heyns, M.M., …

Electrochemical Society
7 国際会議録 THE RELATION BETWEEN SODIUM AND ALUMINUM CONTAMINATION AND DIELECTRIC BREAKDOWN IN MOS STRUCTURES

Verneire, B., Rotondaro, A.L.P., Mertens, P.W., Verhaverbeke, S., Heyns, M.M.

Electrochemical Society
2 国際会議録 A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES

Meuris, M., Verhaverbeke, S., Mertens, P.W., Schmidt, H.F., Rotondaro, A.L.P., Heyns, M.M., Philipossian, A.

Electrochemical Society
8 国際会議録 The potential and restrictions of the double derivative method for threshold voltage extraction in SOI MOSFET's

Simoen, E., Vandamme, E., Rotondaro, A.L.P., Claeys, C.

Electrochemical Society
3 国際会議録 Outplating of Metallic Contaminants on Silicon Wafers from Diluted Acid Solutions

Rotondaro, A. L. P., Hurd, T. Q., Schmidt, H. F., Teerlinck, I., Heyns, M. M., Claeys, C.

MRS - Materials Research Society
9 国際会議録 SURFACE CHARACTERISATION OF Si AFTER HF TREATMENTS AND ITS INFLUENCE ON THE DIELECTRIC BREAKDOWN OF THERMAL OXIDES

Verhaverbeke, S., Alay, J., Mertens, P., Meuris, M., Heyns, M., Vandervorst, W., Murrell, M., Sofield, C.

Materials Research Society
4 国際会議録 METAL INTERACTIONS WITH SILICA (SiO2) SURFACES: ADSORPTION AND ION EXCHANGE

Hurd, T.Q., Schmidt, H.F., Rotondaro, A.L.P., Mertens, P.W., Hall, L.H., Heyns, M.M.

Electrochemical Society
10 国際会議録 In-situ and real time characterization of wet chemical silicon surface processes by electrochemical open circuit potential measurements

Schmidt, H.F, Teerlinck, I., Meuris, M., Mertens, P.W., Heyns, M.M.

Electrochemical Society
5 国際会議録 HF-LAST CLEANINGS: A STUDY OF THE PROPERTIES WITH RESPECT TO THE DIFFERENT VARIABLES

Verhaverbeke, S., Bender, H., Meuris, M., Mertens, P. W., Schmidt, H. F., Heyns, M. M.

MRS - Materials Research Society
11 国際会議録 MODELLING OF THE HYDROGEN PASSIVATION KINETICS OF Si IN DILUTE HF SOLUTIONS

Verhaverbeke, S., Meuris, M., Schmidt, H., Mertens, P., Heyns, M.

Electrochemical Society
6 国際会議録 DEVELOPMENT OF ADVANCED CORROSION FREE ORGANIC STRIPPERS FOR ULSI PROCESSING

Rotondaro, A.L.P., Honda, K., Maw, T., Perry, D., Lux, M., Heyns, M.M., Claeys, C., Darakchiev, I.

Electrochemical Society
12 国際会議録 *CLEANING OF METAL CONTAMINATION

Mertens, P.W., Hurd, T.Q., Graf, D., Meuris, M., Schmidt, H.F., Heyns, M.M.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12