PREVENTION OF PARTICLE DEPOSITION IN HF SOLUTION

PREVENTION OF PARTICLE DEPOSITION IN HF SOLUTION

著者名:

掲載資料名:

Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

1994-7

発行年:

1994

開始ページ:

427

終了ページ:

433

総ページ数:

7

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770385 [1566770386]

言語:

英語

請求記号:

E23400/941397

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014117
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Electrochemical Society Fall Meeting
回次:	3rd ; 1993
会議開催地:	New Orleans, Louisiana, USA
会議開催年:	1993.10.15-1993.10.20

類似資料:

1 国際会議録 MECHANISTIC STUDY OF THE DEPOSITION OF METALS FROM HF SOLUTIONS ONTO SILICON WAFERS Parks, H. G., Hiskey, J. B., Yoneshige, K. MRS - Materials Research Society	7 国際会議録 PARTICLE REMOVAL EFFICIENCY OF DILUTED HF SOLUTIONS Alessandri, M., Bellandi, E., Pipia, F., Crivelli, B., Wolke, K., Schenkl, M. Electrochemical Society
2 国際会議録 Snapshot complete imaging polarimeter using Savart plates (Invited Paper) [6295-09] Oka K., Saito N. SPIE - The International Society of Optical Engineering	8 国際会議録 EFFECT OF H2O2 AND IPA ADDITION IN DILUTE HF SOLUTION ON SURFACE ETCHING AND PARTICLE REMOVAL EFFICIENCY Eom, D.-H., Lee, S.-H., Kim, K.-S., Lee, C.-H., Park, J.-G. Electrochemical Society
3 国際会議録 METAL ADSORPTION MECHANISM ON SI WAFER Takahara, Y., Saito, A., Oka, H. Electrochemical Society	9 国際会議録 EFFECT OF SURFACTANTS ON PARTICLE CONTAMINATION OF SILICON SURFACE IN HF SOLUTIONS Vehmas, T., Ritala, H., Arittila, O. Electrochemical Society
4 国際会議録 PASSIVATION OF Cu PARTICLES ON Si SUBSTRATE BY FOM(HF+O3- UPW) SOLUTION Morita, H., Joo, J.-D., Messoussi, R., Kawada, K., Kim, J.-S., Ohmi, T. Electrochemical Society	10 国際会議録 Cu DEPOSITION FROM HF SOLUTIONS AND EFFECTS ON REGROWTH OF Si NATIVE OXIDE Bedge, Satish, Barron, Bradford S., Lamb, H. Henry MRS - Materials Research Society
5 国際会議録 ACTIVITY OF HF SOLUTIONS AND PARTICLE REMOVAL USING HF SOLUTIONS Nelson, S., Sabol, J., Christenson, K. Electrochemical Society	11 国際会議録 Electrochemical Study of Copper Deposition on Silicon Surfaces in HF Solutions Teerlinek, I., Gomes, W.P., Strubbe, K., Mertens, P.W., Heyns, M.M. Electrochemical Society
6 国際会議録 Chemical Vapor Deposition of Turbostratic and Hexagonal Boron Nitride Sugiyama,K., Itoh,H. Trans Tech Publications	12 国際会議録 Copper Adsorption at a Silicon Surface from HF Solutions Turner, J.E., Miyazaki, K., Fukazawa, Y., Muraoka, H. Electrochemical Society

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