GAS-PHASE ETCHING OF SILICON OXiDE WITH ANHYDROUS HF AND ISOPROPANOL

GAS-PHASE ETCHING OF SILICON OXiDE WITH ANHYDROUS HF AND ISOPROPANOL

著者名:

掲載資料名:

Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

1994-7

発行年:

1994

開始ページ:

374

終了ページ:

383

総ページ数:

10

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770385 [1566770386]

言語:

英語

請求記号:

E23400/941397

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014117
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Electrochemical Society Fall Meeting
回次:	3rd ; 1993
会議開催地:	New Orleans, Louisiana, USA
会議開催年:	1993.10.15-1993.10.20

類似資料:

1 国際会議録 CHARACTERIZATION OF SILICON OXIDE ETCHING IN GAS PHASE HF/VAPOR MIXTURES Muscat, Anthony J., Lawing, Scott A., Sawin, Herbert H., Butterbaugh, Jeff, Syverson, Dan, Hiatt, Fred Electrochemical Society	7 国際会議録 Fabrication of surface-micromachined thermally driven micropump by anhydrous HF gas-phase etching with 2-propanol Jang,W.-I., Choi,C.-A., Lee,M.-L., Jun,C.-H., Kim,Y.T. SPIE-The International Society for Optical Engineering
2 国際会議録 Silicon surface micromachining by anhydrous HF gas-phase etching with methanol Jang,W.I., Choi,C.A., Lee,C.S., Hong,Y.S., Lee,J.H., Baek,J.T., Kim,B.W. SPIE-The International Society for Optical Engineering	8 国際会議録 Characterization of Oxide Etching and Wafer Cleaning Using Vapor-Phase Anhydrous HF and Ozone Froeschle, Barbara, Deutschmann, Lutz, Bauer, Anton J., Burte, Edmund P. MRS - Materials Research Society
3 国際会議録 SILICON CRITICAL CLEANING WITH OZONE, HF AND HCL IN A SPRAY PROCESSOR Butterbaugh, J.W., Olson, E.D., Reaux, C.A. Electrochemical Society	9 国際会議録 SILICON SURFACES EXPOSED TO ANHYDROUS HF/CH3OH ETCHING Torek, K., Ruzyllo, J., Kamieniecki, E. Electrochemical Society
4 国際会議録 Stiction-free release etch with anhydrous HF/water vapor processes Hanestad,R., Butterbaugh,J.W., Ben-Hamida,A., Gelmi,I. SPIE-The International Society for Optical Engineering	10 国際会議録 Etching of Silicon Oxide by HF/Solvent Mixtures Condensed from a Vapor Phase Muscat, A.J., Lawing, A.S., Xu, H., Sawin, H.H. American Institute of Chemical Engineers
5 国際会議録 Dry release process of anhydrous HF gas-phase etching for the fabrication of a vibrating microgyroscope Jang,W.I., Choi,C.A., Hong,Y.S., Jun,C.H., Kim,Y.T., Lee,J.H. SPIE - The International Society for Optical Engineering	11 国際会議録 Microwave Activation of Dopants and Solid Phase Epitaxy in Silicon D.C. Thompson, J. Decker, T.L. Alford, JW. Mayer, N. David Theodore Materials Research Society
6 国際会議録 Characteristics of residual products in HF gas-phase etching of sacrificial oxides for silicon micromachining Jang,W.-I., Choi,C.-A., Lee,C.-S., Hong,Y.-S., Lee,J.-H. SPIE - The International Society for Optical Engineering	12 国際会議録 Selective Silicon Nitride Etching by ECR Plasmas Using SF6 and NF3 Based Gas Mixtures Reyes-Betanzo, C., Moshkalyov, S.A., Swart, J.W., Ramos, A.C.S. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12