Blank Cover Image

HYDROGEN PASSIVATION OF HF-LAST CLEANED (100) SILICON SURFACES: A MIR-FTIR STUDY

著者名:
掲載資料名:
Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
1994-7
発行年:
1994
開始ページ:
186
終了ページ:
194
総ページ数:
9
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770385 [1566770386]
言語:
英語
請求記号:
E23400/941397
資料種別:
国際会議録

類似資料:

1 国際会議録 HF-LAST CLEANINGS: A STUDY OF THE PROPERTIES WITH RESPECT TO THE DIFFERENT VARIABLES

Verhaverbeke, S., Bender, H., Meuris, M., Mertens, P. W., Schmidt, H. F., Heyns, M. M.

MRS - Materials Research Society
7 国際会議録 Advanced Wet Cleaning Technology For Highly Reliable Thin Oxides

Verhaverbeke, S., Meuris, M., Mertens, P., Schmidt, H., Heyns, M.M., Philipossian, A., Graeff, D., Dillenbeck, K.

Electrochemical Society
2 国際会議録 MODELLING OF THE HYDROGEN PASSIVATION KINETICS OF Si IN DILUTE HF SOLUTIONS

Verhaverbeke, S., Meuris, M., Schmidt, H., Mertens, P., Heyns, M.

Electrochemical Society
8 国際会議録 Electrochemical Study of Copper Deposition on Silicon Surfaces in HF Solutions

Teerlinek, I., Gomes, W.P., Strubbe, K., Mertens, P.W., Heyns, M.M.

Electrochemical Society
3 国際会議録 SILICON SURFACE ROUGHENING BY THE DECOMPOSITION OF HYDROGEN PEROXIDE

Mertens, P.W., Verhaverbeke, S., Heyns, M.M., Hellemans, L., Snauwaert, J., Dillenbeck, K.

Electrochemical Society
9 国際会議録 CRITICAL ASPECTS OF WAFER CLEANING AND GATE OXIDE INTEGRITY

Mertens, P.W., Meuris, M., Schmidt, H.F., Verhaverbeke, S., Heyns, M.M., Carr, P., Graeff, D., Schnegg, A., Kubota, M., …

Electrochemical Society
4 国際会議録 IN-LINE MONITORING OF HF-LAST CLEANING OF IMPLANTED AND NON-IMPLANTED SILICON SURFACES BY NON-CONTACT SURFACE CHARGE MEASUREMENTS

Kondoh, E., Trauwaert, M.-A., Heyns, M., Maex, K.

Electrochemical Society
10 国際会議録 HF Last Cleaning Before Silicon Epitaxy

Patruno, P., Fleury, A., Wyborn, H., Andre, E., Tardif, F.

Electrochemical Society
5 国際会議録 A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES

Meuris, M., Verhaverbeke, S., Mertens, P.W., Schmidt, H.F., Rotondaro, A.L.P., Heyns, M.M., Philipossian, A.

Electrochemical Society
11 国際会議録 SURFACE CHARACTERISATION OF Si AFTER HF TREATMENTS AND ITS INFLUENCE ON THE DIELECTRIC BREAKDOWN OF THERMAL OXIDES

Verhaverbeke, S., Alay, J., Mertens, P., Meuris, M., Heyns, M., Vandervorst, W., Murrell, M., Sofield, C.

Materials Research Society
6 国際会議録 IN SITU AND REAL TIME STUDIES OF WET CHEMICAL SILICON SURFACE CLEANING REACTIONS

Schmidt, H.F., Teerlinck, I., Storm, W., Bender, H., Heyns, M.M.

Electrochemical Society
12 国際会議録 A HF VAPOUR ETCH PROCESS FOR INTEGRATION IN CLUSTER-TOOL PROCESSES: CHARACTERISTICS AND APPLICATIONS

Vermeulen, W.J.C., Kwakman, L.F.Tz., Werkhoven, C.J., Granneman, E.H.A., Verhaverbeke, S., Heyns, M.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12