A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES

A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES

著者名:

Meuris, M.

掲載資料名:

Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

1994-7

発行年:

1994

開始ページ:

15

終了ページ:

25

総ページ数:

11

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770385 [1566770386]

言語:

英語

請求記号:

E23400/941397

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014117
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Electrochemical Society Fall Meeting
回次:	3rd ; 1993
会議開催地:	New Orleans, Louisiana, USA
会議開催年:	1993.10.15-1993.10.20

類似資料:

1 国際会議録 IMPACT OF THE ELECTROCHEMICAL PROPERTIES OF SILICON WAFER SURFACES ON COPPER OUTPLATING FROM HF SOLUTIONS Teerlinck, I., Schmidt, H.F., Rotondaro, A.L.P., Hurd, T.Q., Mouche, L., Mertens, P.W., Meuris, M., Heyns, M.M., … Electrochemical Society	7 国際会議録 Advanced Wet Cleaning Technology For Highly Reliable Thin Oxides Verhaverbeke, S., Meuris, M., Mertens, P., Schmidt, H., Heyns, M.M., Philipossian, A., Graeff, D., Dillenbeck, K. Electrochemical Society
2 国際会議録 HF-LAST CLEANINGS: A STUDY OF THE PROPERTIES WITH RESPECT TO THE DIFFERENT VARIABLES Verhaverbeke, S., Bender, H., Meuris, M., Mertens, P. W., Schmidt, H. F., Heyns, M. M. MRS - Materials Research Society	8 国際会議録 NEW WET CLEANING STRATEGIES FOR OBTAINING HIGHLY RELIABLE THIN OXIDES Heyns, M. M., Verhaverbeke, S., Meuris, M., Mertens, P. W., Schmidt, H., Kubota, M., Philipossian, A., Dillenbeck, K., … MRS - Materials Research Society
3 国際会議録 THE RELATION BETWEEN SODIUM AND ALUMINUM CONTAMINATION AND DIELECTRIC BREAKDOWN IN MOS STRUCTURES Verneire, B., Rotondaro, A.L.P., Mertens, P.W., Verhaverbeke, S., Heyns, M.M. Electrochemical Society	9 国際会議録 MODELLING OF THE HYDROGEN PASSIVATION KINETICS OF Si IN DILUTE HF SOLUTIONS Verhaverbeke, S., Meuris, M., Schmidt, H., Mertens, P., Heyns, M. Electrochemical Society
4 国際会議録 METAL INTERACTIONS WITH SILICA (SiO2) SURFACES: ADSORPTION AND ION EXCHANGE Hurd, T.Q., Schmidt, H.F., Rotondaro, A.L.P., Mertens, P.W., Hall, L.H., Heyns, M.M. Electrochemical Society	10 国際会議録 In-situ and real time characterization of wet chemical silicon surface processes by electrochemical open circuit potential measurements Schmidt, H.F, Teerlinck, I., Meuris, M., Mertens, P.W., Heyns, M.M. Electrochemical Society
5 国際会議録 CRITICAL ASPECTS OF WAFER CLEANING AND GATE OXIDE INTEGRITY Mertens, P.W., Meuris, M., Schmidt, H.F., Verhaverbeke, S., Heyns, M.M., Carr, P., Graeff, D., Schnegg, A., Kubota, M., … Electrochemical Society	11 国際会議録 A SEMI-QUANTITATIVE METHOD FOR STUDYING PHOTORESIST STRIPPING Rotondaro, A.L.P., Meuris, M., Schmidt, H.F., Heyns, M.M., Vandervorst, W., Claeys, C., Hellemans, L., Snauvaert, I. Electrochemical Society
6 国際会議録 *CLEANING OF METAL CONTAMINATION Mertens, P.W., Hurd, T.Q., Graf, D., Meuris, M., Schmidt, H.F., Heyns, M.M. Electrochemical Society	12 国際会議録 SILICON SURFACE ROUGHENING BY THE DECOMPOSITION OF HYDROGEN PEROXIDE Mertens, P.W., Verhaverbeke, S., Heyns, M.M., Hellemans, L., Snauwaert, J., Dillenbeck, K. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12