A Study of Highly Selective Oxide Etching by ECR Plasma

A Study of Highly Selective Oxide Etching by ECR Plasma

著者名:

掲載資料名:

Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

1993-21

発行年:

1993

開始ページ:

201

終了ページ:

207

総ページ数:

7

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770668 [1566770661]

言語:

英語

請求記号:

E23400/932473

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014110
シリーズID:	PA00000028
会議名:	Symposium on Highly Selective Dry Etching and Damage Control
回次:	1993
会議開催地:	Honolulu, HI, USA
会議開催年:	1993.05.19-1993.05.21

類似資料:

1 国際会議録 Highly Selective Etching of an SiO2 Film to a Metal Layer Hisada, M., Nakamura, S., Hosoki, A. Electrochemical Society	7 国際会議録 Diagnostics and Control of High-Density Etching Plasmas Sugai, H., Nakamura, K., Ahn, T. H., Nakamura, M. MRS - Materials Research Society
2 国際会議録 Anisotropic ECR Plasma Etching with Low-Energy Ions Tobinaga,Y., Miyano,T., Fujimoto,K., Fujito,M., Fujiwara,H. Trans Tech Publications	8 国際会議録 ATOM-PROBE STUDY OF SELECTIVE OXIDATION OF Ni FROM Cu-Ni ALLOY Hono, K., Nakamura, M., Pickering, H.W., Sakurai, T. Materials Research Society
3 国際会議録 Effect of Magnetic Field Configuration on ECR Plasma Etching Fujiwara, N., Yoneda, M., Nakamoto, K., Tsukamoto, K. Electrochemical Society	9 国際会議録 Low Damage And Selective Etching of GaAs Using BCl3/SF6 Gas in ECR Plasma Oikawa, H., Kohno, M., Mochizuki, A., Nashimoto, Y. Electrochemical Society
4 国際会議録 High Rate and Highly Selective Etching of SiO Using Microwave Plasma Nawata, M., Kakehi, Y., Kanai, S., Kawasaki, Y., Tunokuni, K., Enami, H. Electrochemical Society	10 国際会議録 Plasma Chemistry Dependent ECR Etching of GaN Shul, R. J., Ashby, C. I. H., Rieger, D. J., Howard, A. J., Pearton, S. J., Abernathy, C. R., Vartuli, C. B., Barnes, P. … MRS - Materials Research Society
5 国際会議録 ECR plasma oxidation: Dependence on energy of argon ion Matsuo, S., Yamamoto, M., Sadoh, T., Tsurushima, T., Gao, D. W., Furukawa, K., Nakashima, H. MRS-Materials Research Society	11 国際会議録 Modified ECR Plasma Deposition Nakamura,S., Akahori,T., Nakayama,S. Trans Tech Publications
6 国際会議録 ECR Plasma Etching of GaAs in CCI2F2/Ar Discharge Singh, L.S.S., Tiwary, K.P., Khan, M.N., Purohit, R.K., Zaidi, Z.H. SPIE-The International Society for Optical Engineering	12 国際会議録 ECR, ICP and RIE plasma etching of GaN Shul, R.J., McClellan, G.B., Rieger, D.J., Hafich, M.J., Drummond, T.J., Pearton, S.J., Abernathy, C.R., Constantine, … Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12