Real Time Monitoring of Silicon Surface Cleaning Using H2 and NH3 Plasmas

Real Time Monitoring of Silicon Surface Cleaning Using H2 and NH3 Plasmas

著者名:

掲載資料名:

Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

1993-21

発行年:

1993

開始ページ:

35

終了ページ:

46

総ページ数:

12

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770668 [1566770661]

言語:

英語

請求記号:

E23400/932473

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014110
シリーズID:	PA00000028
会議名:	Symposium on Highly Selective Dry Etching and Damage Control
回次:	1993
会議開催地:	Honolulu, HI, USA
会議開催年:	1993.05.19-1993.05.21

類似資料:

1 国際会議録 Real Time In-Situ Monitoring of Surface Reactions During Plasma Passivation of GaAs E. S. Aydil, Z. H. Zhou, R. A. Gottscho, Y. J. Chabal Electrochemical Society	7 国際会議録 Nano-Scale Plasma Etching for Silicon Technology Gottscho, R.A. Electrochemical Society
2 国際会議録 Plasma Passivation of III-V Semiconductor Surfaces Aydil,E.S., Gottscho,R.A. Trans Tech Publications	8 国際会議録 *ETCHING OF SILICON (111) AND (100) SURFACES IN HF SOLUTIONS: H-TERMINATION, ATOMIC STRUCTURE AND OVERALL MORPHOLOGY Chabal, Y.J. Materials Research Society
3 国際会議録 Multiple Steady States and Abrupt Transitions in an Electron Cyclotron Resonance Plasma Reactor Aydil, E.S., Gregus, J.A., Jarnyk, M.A., Gottscho, R.A. Electrochemical Society	9 国際会議録 Hydrogen Nanochemistry Achieving Clean and Pre-Oxidized Silicon Carbide Surface Metallization Soukiassian, P., Silly, M.G., Radtke, C., Enriquez, H., D'angelo, M., Derycke, V., Yu. Aristov, V., Amy, F., Chabal, … Trans Tech Publications
4 国際会議録 REAL-TIME MONITORING AND CONTROL OF SILICON EPITAXY USING EMISSION FOURIER TRANSFORM INFRARED SPECTROSCOPY Zhou, Z. H., Kim, H., Reif, Rafael MRS - Materials Research Society	10 国際会議録 *TIME-RESOLVED DIAGNOSTICS OF RF PLASMAS: A FLUID MODEL FOR ION CONCENTRATIONS IN THE SHEATH Gottscho, R. A. Materials Research Society
5 国際会議録 In Situ Real-Time Diagnostics of Surfaces During Plasma Processing: A Review Aydil, E.S. Electrochemical Society	11 国際会議録 206b. in Situ* Real-Time Diagnostics for Studying the Structural Evolution of Nanocrystalline Silicon Thin Films during Plasma Deposition* Radhika C. Mani, Eray S. Aydil American Institute of Chemical Engineers
6 国際会議録 The Influence of HF, 0H, and Dissolved 02 on Silicon Surface Chemical Cleaning Higashi, G.S., Chabal, Y.J., Raghavachari, K., Becker, R.S., Green, M.P., Hanson, K., Boone, T., Eisenberg, J.H., Shive, … Electrochemical Society	12 国際会議録 Plasma Etching for Ultra Large Scale Integrated Circuit Manufacturing Gottscho, R.A. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12