SOI Technology for Deep-Submicron CMOS Applications,

SOI Technology for Deep-Submicron CMOS Applications,

著者名:: Colinge, J.-P.
掲載資料名:: Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993
シリーズ名:: Electrochemical Society Proceedings Series
シリーズ巻号:: 1993-13
発行年:: 1993
開始ページ:: 39
終了ページ:: 54
総ページ数:: 16
出版情報:: Pennington, NJ: Electrochemical Society
ISSN:: 01616374
ISBN:: 9781566770637 [1566770637]
言語:: 英語
請求記号:: E23400/932028
資料種別:: 国際会議録

詳細

TDL書誌ID:	ZA00014102
シリーズID:	PA00000028
会議名:	International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology
回次:	4th
会議開催地:	Honolulu, Hawaii, USA
会議開催年:	1993.05.17-1993.05.18

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