Challenges in Integration of Metal Gate High-k Dielectrics Gate Stacks
- 著者名:
- 掲載資料名:
- Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2004-01
- 発行年:
- 2004
- 開始ページ:
- 321
- 終了ページ:
- 327
- 総ページ数:
- 7
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774062 [1566774063]
- 言語:
- 英語
- 請求記号:
- E23400/200401
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
Electrochemical Society |
Materials Research Society |
Electrochemical Society |
Materials Research Society |
9
国際会議録
13 High-k Gate Stack Engineering - towards Meeting Low Standby Power and High Performance Targets
Electrochemical Society |
Electrochemical Society |
Springer |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |