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Nickel SALICIDE Technology for Sub-100 nm CMOS Devices

著者名:
Lu, J.P.
Miles, D.
Li-Fatou, A.
Xu, Y.Q.
Zhao, J.
Gurba, A.
Griffin, A., Jr.
Hornug, B.
Hewson, M.
Grider, T.
Mercer, D.
Montgomery, C.
さらに 7 件
掲載資料名:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2004-01
発行年:
2004
開始ページ:
159
終了ページ:
173
総ページ数:
15
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774062 [1566774063]
言語:
英語
請求記号:
E23400/200401
資料種別:
国際会議録

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