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Structure and Dynamics of Si Interstitials at Si(001) and Si(001)/SiO2

著者名:
掲載資料名:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2004-01
発行年:
2004
開始ページ:
112
終了ページ:
119
総ページ数:
8
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774062 [1566774063]
言語:
英語
請求記号:
E23400/200401
資料種別:
国際会議録

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