Blank Cover Image

Defect Behavior and Control in Advanced CMOS Process Technologies

著者名:
掲載資料名:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2004-01
発行年:
2004
開始ページ:
50
終了ページ:
65
総ページ数:
16
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774062 [1566774063]
言語:
英語
請求記号:
E23400/200401
資料種別:
国際会議録

類似資料:

1 国際会議録 Defect Engineering in High-Mobility Substrates for Advanced CMOS Technologies (Invited)

Claeys, C., Simoen, E.

Electrochemical Society
7 国際会議録 Impact of Thermal Budget on Junction Leakage in a 0.18 and 0.13 μm CMOS Technology

Poyai, A., Simoen, E., Claeys, C., Rooyackers, R., Redolfi, A.

Electrochemical Society
2 国際会議録 The effect of substrate radiation-induced defects on the operation of deep submicron silicon technologies

Simoen, E., Claeys, C., Poyai, A.

Electrochemical Society
8 国際会議録 The Impact of Processing-Induced Defects on the Electrical Characteristics and the Degradation of Si n+p Junctions

Simoen, E., Vanhellemont, J., Kaniava, A., Claeys, C.

Electrochemical Society
3 国際会議録 Noise Diagnostics for Advanced Silicon Substrates and Deep Submicron Process Modules

Simoen, E., Mercha, A., Claeys, C.

SPIE-The International Society for Optical Engineering
9 国際会議録 The Potential and Restrictions of Silicon-on-Insulator Technologies for Cryogenic Applications

C. Claeys, E. Simoen

Electrochemical Society
4 国際会議録 Noise Diagnostics of Advanced Silicon Substrates and Deep Submicron Process Modules

Simoen, E., Mercha, A., Claeys, C.

Electrochemical Society
10 国際会議録 Electrical Performance and Reliability Aspects of Strain Engineered Deep Submicron CMOS Technologies

C. Claeys, G. Eneman, M. Bargallo Gonzalez, S. Put, E. Simoen

Electrochemical Society
5 国際会議録 The use of body ties in cryogenic SOI CMOS

Simoen, E., Claeys, C.

Electrochemical Society
11 国際会議録 Lattice Defects in High Resistivity Silicon

Claeys, C., Simoen, E., Vanhellemont, J.

Electrochemical Society
6 国際会議録 1/f noise in deep-submicron CMOS technology for RF and analog applications (Invited Paper)

Mercha, A., Simoen, E., Decoutere, S., Claeys, C.

SPIE - The International Society of Optical Engineering
12 国際会議録 Optimisation of Cryogenic CMOS Technology and Design for Deep Cryogenic Analog Circuits

Dierickx, B., Simoen, E., Vermeiren, J., Cos, S., Claeys, C., Declerck, G.

ESA Publications Division
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12