STUDY OF THE EFFECT OF SILICON SURFCE TREATMENT ON EOT IN HIGH-k DIELECTRIC MOS GATE STACK | 東京工業大学附属図書館文献データベース

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STUDY OF THE EFFECT OF SILICON SURFCE TREATMENT ON EOT IN HIGH-k DIELECTRIC MOS GATE STACK

著者名:

Shanmugasundaram, K.

Shallenberger, J.

さらに 6 件

掲載資料名:

Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2003-26

発行年:

2003

開始ページ:

78

終了ページ:

85

総ページ数:

8

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566774116 [156677411X]

言語:

英語

請求記号:

E23400/200326

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014088
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Meeting of the Electrochemical Society
回次:	8th ; 2003
会議開催地:	Orlando, Florida, USA
会議開催年:	2003.10.00

類似資料:

1 国際会議録 49 Characteristics of Hf(Si,O) Gate Dielectrics as a Function of Hf Content Chang, K., Shallenberger, J., Chang, F.-M., Shanmugasundaram, K., Roman, P., Mumbauer, P., Ruzyllo, J. Electrochemical Society	7 国際会議録 REVERSING OF SILICON SURFACE AGING BY LAMP CLEANING Shanmugasundaram, K., Chang, K., Shallenberger, J., Danel, A., Tardif, F., Ruzyllo, J. Electrochemical Society
2 国際会議録 Studies of High-k Gate Dielectrics Deposited hy the Liquid Source Misted Chemical Deposition Method Lee, D., Roman, P., Mumbauer, P., Grant, R., Horn, M., Ruzyllo, J. Electrochemical Society	8 国際会議録 Gate dielectric monitoring using noncontact electrical characterization Ruzyllo,J., Roman,P., Lee,D.-O., Brubaker,M., Kamieniecki,E. SPIE - The International Society for Optical Engineering
3 国際会議録 GAS-PHASE SURFACE CONDITIONING IN A HIGH-k GATE CLUSTER Roman, P., Lee, D.-O., Wang, J., Wu, C.-T., Subramanian, V., Brubaker, M., Mumbauer, P., Grant, R., Ruzyllo, J. Electrochemical Society	9 国際会議録 53. Effect of thermal annealing on mist-deposited HISiO4/SiO,/Si structures Chong, K., Lee, D.-O., Shanmugosondoroni, K., Romon, P., Shallenberger, J., Wang, I., Mumbaner, P., Grant, R., Rusyllo, … Electrochemical Society
4 国際会議録 Characterization of High-K Dielectrics Using the Non-Contact Surface Charge Profiler (SCP) Method Roman, P., Lee, D., Mumbauer, P., Grant, R., Kamieniecki, E., Ruzyllo, J. Electrochemical Society	10 国際会議録 SURFACE ROUGHNESS IN SILICON CARBIDE TECHNOLOGY K. Chang, T. Witt, A. Hoff, R. Woodin, R. Ridley, G. Dolny, K. Shanmugasundaram, E. Oborina, J. Ruzyllo Electrochemical Society
5 国際会議録 Characterization of Thin Dielectric Layers using the Non-Contact Surface Charge Profiler (SCP) Method Roman, P., Lee, D.D., Wang, J., Mumbauer, P., Grant, R., Tower, J., Kamieniecki, E., Lukasiak, L., Ruzyllo, aud J. Electrochemical Society	11 国際会議録 Electrical Studies on Metal/SrTa2O6 or TiO2/ Si Substrate Stack Systems O. O. Awadelkarim, J. Jiang, S. A. Suliman, K. Saipatwari, L. J. Passmore, D. Lee, P. Roman, J. Ruzyllo Electrochemical Society
6 国際会議録 EFFECT OF SILICON SURFACE CONDITION ON FILM FORMATION USING MIST DEPOSITION K. Shanmugasundaram, K. Chang, J. Ruzyllo Electrochemical Society	12 国際会議録 Mist Deposition for TFT Technology K. Shanmugasundaram, S. Price, K. Chang, D. Lee, J. Ruzyllo Electrochemical Society

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