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53. Effect of thermal annealing on mist-deposited HISiO4/SiO,/Si structures

著者名:
Chong, K.
Lee, D.-O.
Shanmugosondoroni, K.
Romon, P.
Shallenberger, J.
Wang, I.
Mumbaner, P.
Grant, R.
Rusyllo, J.
さらに 4 件
掲載資料名:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2003-14
発行年:
2003
開始ページ:
429
終了ページ:
436
総ページ数:
8
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773966 [1566773962]
言語:
英語
請求記号:
E23400/200314
資料種別:
国際会議録

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