Comparison Between the Leakage Drain Current Behavior in SOI pMOSFETs and SOI nMOSFETs Operating at 300℃
- 著者名:
- 掲載資料名:
- Microelectronics technology and devices : SBMICRO 2003 : proceedings of the eighteenth international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2003-9
- 発行年:
- 2003
- 開始ページ:
- 87
- 終了ページ:
- 94
- 総ページ数:
- 8
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773898 [156677389X]
- 言語:
- 英語
- 請求記号:
- E23400/200309
- 資料種別:
- 国際会議録
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