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Low Temperature Processing of SiO2 Thin Films by PECVD Technique Using an Inductively-Coupled High-Density RF Plasma Source

著者名:
掲載資料名:
Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2003-8
発行年:
2003
開始ページ:
638
終了ページ:
645
総ページ数:
8
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773782 [1566773784]
言語:
英語
請求記号:
E23400/200308
資料種別:
国際会議録

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