Scaling Issues for Advanced SOI Devices: Gate Oxide Tunneling, Thin Buried Oxide, and Ultra-Thin Films
- 著者名:
Pretet, J. Ohata, A. Dieudonne, F. Allibert, F. Bresson, N. Matsumoto, T. Poiroux, T. Jomaah, J. Cristoloveanu, S. - 掲載資料名:
- Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2003-2
- 発行年:
- 2003
- 開始ページ:
- 476
- 終了ページ:
- 487
- 総ページ数:
- 12
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773478 [1566773474]
- 言語:
- 英語
- 請求記号:
- E23400/200302
- 資料種別:
- 国際会議録
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