Analysis of Short-channel MOSFET Behavior after Gate Oxide Breakdown and its Impact on Digital Circuit Reliability
- 著者名:
- 掲載資料名:
- Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2003-2
- 発行年:
- 2003
- 開始ページ:
- 173
- 終了ページ:
- 198
- 総ページ数:
- 26
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773478 [1566773474]
- 言語:
- 英語
- 請求記号:
- E23400/200302
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
*Impact of temperature and breakdown statistics on reliability predictions for ultrathin oxides
MRS-Materials Research Society |
Electrochemical Society |
Electrochemical Society |
Springer |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
10
国際会議録
Toward Understanding the Wide Distribution of Time Scales in Negative Bias Temperature Instability
Electrochemical Society |
Electrochemical Society |
Materials Research Society |
MRS-Materials Research Society |
Electrochemical Society |