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HfO2 Thin Films Deposited On SOT by Ion Beam Enhanced Deposition

著者名:
  • Tao, K. ( (Institute of Microsystem and Information Technology, Chinese Academy of Science) )
  • Yu, Y. ( (Institute of Microsystem and Information Technology, Chinese Academy of Science) )
掲載資料名:
Dielectrics in emerging technologies : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2003-1
発行年:
2003
開始ページ:
367
終了ページ:
373
総ページ数:
7
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773461 [1566773466]
言語:
英語
請求記号:
E23400/200301
資料種別:
国際会議録

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