Investigation of ru Thin Films Prepared by Chemical Vapor Deposition as Bottom Electrodes for Memory Applications

Investigation of ru Thin Films Prepared by Chemical Vapor Deposition as Bottom Electrodes for Memory Applications

著者名:

Kang, S.Y. ( (Seoul National University, School of Materials Science & Engineering) )
Lim, H.J. ( (Seoul National University, School of Materials Science & Engineering) )
Hwang, C.S. ( (Seoul National University, School of Materials Science & Engineering) )
Kim, H.J. ( (Seoul National University, School of Materials Science & Engineering) )

掲載資料名:

Dielectrics in emerging technologies : proceedings of the international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2003-1

発行年:

2003

開始ページ:

305

終了ページ:

312

総ページ数:

8

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773461 [1566773466]

言語:

英語

請求記号:

E23400/200301

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014064
シリーズID:	PA00000028
会議名:	International Symposium on Science and Technology of Dielectrics in Emerging Fields
回次:	1st
会議開催地:	Paris, France
会議開催年:	2003.04.27-2003.05.02

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