Low temperature Doping of Silicon by Hydrogen Plasma Treatments*
- 著者名:
Job, R. Ulyashin, A.G. Ma, Y. Fahnwr, W.R. Simoen, E. Rafi, J.M. Claeys, C. Niedernostheide, F.J. Schulze, H.J. - 掲載資料名:
- High purity silicon VII : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2002-20
- 発行年:
- 2002
- 開始ページ:
- 141
- 終了ページ:
- 154
- 総ページ数:
- 14
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773447 [156677344X]
- 言語:
- 英語
- 請求記号:
- E23400/200220
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
Materials Research Society |
Electrochemical Society |
3
国際会議録
Effective Lifetime of Minority Carriers in Silicon: the Role of Heat- and Hydrogen Plasma Treatments
Electrochemical Society |
Materials Research Society |
SPIE-The International Society for Optical Engineering | |
Materials Research Society |
Electrochemical Society |
Electrochemical Society, SPIE-The International Society for Optical Engineering |
Electrochemical Society |