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In Situ Monitoring of Thin Film Reactions During Rapid Thermal Annealing: Nickel Silicide Formation

著者名:
Lavoje, C.
Purtell, R.
Cola, C.
Detavernier, C.
Desjardins, P.
Jordan-Sweet, J.
Cabral, C., Jr.
d'Heurle, F.M.
Harper., J.M.E.
さらに 4 件
掲載資料名:
Rapid thermal and other short-time processing technologies III : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2002-11
発行年:
2002
開始ページ:
455
終了ページ:
468
総ページ数:
14
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773348 [1566773342]
言語:
英語
請求記号:
E23400/200211
資料種別:
国際会議録

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