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Stability of Ultra-Shallow Junctions Formed by 0.2 keV Boron Implantation and Spike Annealing

著者名:
ang, J. Bennett
L., Larsen
I., Rusakova
H., Chen
J., Lia
W.-K., Chu
Shao, L.
Wang, X.
Bennett, J.
Larsen, L.
Rusakova, I.
Chen, H.
Lia, J.
Chu, W.-K.
さらに 9 件
掲載資料名:
Rapid thermal and other short-time processing technologies III : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2002-11
発行年:
2002
開始ページ:
333
終了ページ:
338
総ページ数:
6
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773348 [1566773342]
言語:
英語
請求記号:
E23400/200211
資料種別:
国際会議録

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