Process Optimization in Atomic Layer Deposition of High-K Oxides for Advanced Gate Stack Engineering | 東京工業大学附属図書館文献データベース

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Process Optimization in Atomic Layer Deposition of High-K Oxides for Advanced Gate Stack Engineering

著者名:

Londergan, A.R.

さらに 7 件

掲載資料名:

Rapid thermal and other short-time processing technologies III : proceedings of the international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2002-11

発行年:

2002

開始ページ:

163

終了ページ:

176

総ページ数:

14

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773348 [1566773342]

言語:

英語

請求記号:

E23400/200211

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014045
シリーズID:	PA00000028
会議名:	International Symposium on Rapid Thermal and Other Short-Time Processing Technologies ; Meeting of the Electrochemical Society
回次:	3rd ; 201st
会議開催地:	Philadelphia, Pennsylvania, USA
会議開催年:	2002.05.13-2002.05.16

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